Company

About Integrated Materials, Inc.

Integrated Materials has developed the patented SiFusion™ technology to manufacture a unique and advantageous line of pure polycrystalline silicon components for use by integrated circuit manufacturers in high temperature deposition and diffusion processes.

Since its founding in 1998, Integrated Materials has focused on improving semiconductor furnace processes. Observing that most furnace processing problems originate from the fixtures used to support the product wafers in the furnace, it perceived that better set of internals could make a large impact on wafer quality and process cost.

In 2004, Integrated Materials launched its next phase of operations, offering SiFusion for qualification. In March 2006, Integrated Materials launched the SiFusion family of poly silicon furnaceware globally. At that point, SiFusion was already the tool of record at one of the largest semiconductor manufacturers in North America.

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